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Hafnium Silicide (HfSi2) is widely used as a high temperature, anit-oxidation coating, in metal ceramics, in high temperature structure materials and aerospace industries. It is dark gray, odorless, and insoluble in water.
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Hafnium disilicide (HfSi2) is a transition metal silicide, a type of refractory intermetallic compound. Because of its unique physical and chemical properties, it is used in cermets, high-temperature oxidation-resistant coatings, high-temperature structural materials and aviation, Aerospace and other fields.
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Hafnium silicide nanopowder, also known as hafnium silicide nanoparticle or nano hafnium silicide powder. It refers to the ultrafine hafnium silicide powder with the particle size of 1-100nm. According to the shape, there are spherical hafnium silicide nanoparticles and irregular hafnium silicide nanoparticles.
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Hafnium silicide power has a high melting point, high corrosion resistance, high oxidation resistance, good electrical conductivity, high-temperature ductility, a binary alloy system the intermediate phase, dual characteristics of metals and ceramics. Technical Parameter:
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Materion Advanced Chemicals Hafnium silicide; Purity: 99.5 (Zr <2.5%), CAS 1, Materion Item Number 122967. Call 414-289-9800 to order.
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About Hafnium Silicide Hafnium Silicide is generally immediately available in most volumes. High purity, submicron and nanopowder forms may be considered.
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Hafnium silicide HfSi2 application. Hafnium silicide is a transition metal silicide, a refractory intermetallic compound. Due to its unique physical and chemical properties, silicide has been successfully used in CMOS devices, Thin film coatings, block structures, electric heating elements, thermoelectric materials and photovoltaic materials, etc.
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Hafnium silicide is a transition metal silicide, a refractory intermetallic compound. Due to its unique physical and chemical properties, silicide has been successfully used in CMOS devices, Thin film coatings, block structures, electric heating elements, thermoelectric materials and photovoltaic materials, etc.
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American Elements specializes in producing high purity Hafnium Silicide Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Our standard Sputtering Targets for thin film are available monoblock or bonded …
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Hafnium Silicide is generally immediately available in most volumes. High purity, submicron and nanopowder forms may be considered. American Elements produces to many standard grades when applicable, including Mil Spec (military grade); ACS, Reagent and Technical Grade; Food, Agricultural and Pharmaceutical Grade; Optical Grade, USP and EP/BP (European …
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Hafnium silicide is a kind of transition metal silicide with gray black appearance. The chemical formula is HfSi2. The melting point is 1680 °C. The density was 8.02 g / cm3. Hafnium silicide is insoluble in water. Hafnium silicide is mainly used in semiconductor components, thin film coating, block structure components, electric heating ...
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Overview of hafnium silicide HfSi2 powder. Hafnium silicide is a transition metal silicide, a refractory intermetallic compound.. Due to its unique physical and chemical properties, hafnium silicide has been successfully used in CMOS devices, thin-film coatings, box structures, electric heating elements, thermoelectric materials and photovoltaic materials.
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Hafnium Silicide (HfSi2) is widely used as a high temperature, anit-oxidation coating, in metal ceramics, in high temperature structure materials and aerospace industries. It is dark gray, odorless, and insoluble in water. Product Cost Note: Prices are subject to change without notice due to market conditions Product Notes
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Hafnium silicide. Hafnium disilicide. hafnium;silicon. 1. Chromium Sulfide (Cr2S3) Sputtering Targets
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Hafnium Silicide. Hafnium (atomic symbol: Hf, atomic number: 72) is a Block D, Group 4, Period 6 element with an atomic weight of 178.49. In its elemental form, hafnium has a lustrous silvery-gray appearance. Hafnium does not exist as a free element in nature. It is found in zirconium compounds such as zircon.
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Hafnium silicate is the hafnium(IV) salt of silicic acid with the chemical formula of HfSiO 4.. Thin films of hafnium silicate and zirconium silicate grown by atomic layer deposition, chemical vapor deposition or MOCVD, can be used as a high-k dielectric as a replacement for silicon dioxide in modern semiconductor devices. The addition of silicon to hafnium oxide increases the band …
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Hafnium silicide power has high melting point, high corrosion resistance, high oxidation resistance, good electrical Characteristics of Hafnium Silicide Powder. Hafnium silicide is a transition metal silicide, which is a kind of refractory intermetallic compound. Because of its unique physical and chemical properties, it has been successfully ...
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Hafnium silicate is the hafnium (IV) salt of silicic acid with the chemical formula of HfSiO 4 . Thin films of hafnium silicate and zirconium silicate grown by atomic layer deposition, chemical vapor deposition or MOCVD, can be used as a high-k dielectric as a replacement for silicon dioxide in modern semiconductor devices.
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